碳化硅X射线探测器的能量沉积仿真与结构设计
首发时间:2023-06-07
摘要:碳化硅(SiC)是一种宽带隙半导体材料,具有位移阈能大、击穿电场高、电子饱和漂移速度快、热导率高等优良特性,适合于制备耐高温抗辐照X射线探测器。本文通过蒙特卡罗模拟软件(Geant4)模拟了104μm厚度碳化硅对X射线的能量沉积情况。首先研究了55Fe、241Am和109Cd所发射的X射线光子在碳化硅内的透过情况,发现55Fe和241Am所发射的5.9keV和13.9keV的X射线光子在碳化硅内的完全吸收较为明显,而109Cd发射的22.1keV的X射线基本未发生明显的吸收。其次基于55Fe所发射的X射线(~5.9keV),研究了铝和磷掺杂对4H-SiC内X射线能量沉积的影响,发现碳化硅内中等浓度掺杂未对X射线的能量沉积产生明显影响。最后通过数据分析发现,55Fe射线源所释放出的5.9keV的X射线主要通过光电效应机制在碳化硅内沉积能量。使用4H-SiC材料设计了基于PiN结构的碳化硅X射线探测器,并使用Silvaco进行了电学特性的仿真。探测器的工作电压为1050V,灵敏区为100 μm,正向开启电压为6 V,在25 V正向电压下即可达到10 mA的电流。
关键词: 微电子学与固体电子学 4H-SiC X射线探测
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Energy deposition simulation and structure design of SiC X-ray detector
Abstract:Silicon carbide (SiC) is a wide bandgap semiconductor material with excellent characteristics such as large displacement threshold energy, high breakdown electric field, fast electron saturation drift speed and high thermal conductivity, which is suitable for the preparation of high temperature and radiation resistant X-ray detectors. In this paper, Monte Carlo simulation software (Geant4) simulated the energy deposition of X-rays by 104 μm thickness silicon carbide. Firstly, the permeability of X-ray photons emitted by 55Fe, 241Am and 109Cd in silicon carbide was studied, and it was found that the X-ray photons emitted by 55Fe and 241Am were completely absorbed in silicon carbide, while the X-rays emitted by 109Cd were basically not significantly absorbed. Secondly, based on the X-rays (~5.9keV) emitted by 55Fe, the effects of aluminum and phosphorus doping on X-ray energy deposition in 4H-SiC were studied, and it was found that the medium concentration doping in silicon carbide did not have a significant effect on X-ray energy deposition. Finally, through data analysis, it is found that the 5.9keV X-rays released by the 55Fe ray source mainly deposit energy in silicon carbide through the photoelectric effect.A silicon carbide X-ray detector based on PiN structure was designed using 4H-SiC materials, and electrical parameters were simulated using Silvaco. The detector operates at 1050 V, has a sensitive area of 100 μm, and a forward opening voltage of 6 V, reaching a current of 10 mA at 25 V.
Keywords: Microelectronics and solid-state electronics;4H-SiC;X-ray detection
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